Applications of Organopolysilazanes in the Semiconductor Industry
Organopolysilazanes have broad application prospects in the semiconductor industry. With their unique physical and chemical properties, they are becoming an indispensable material in semiconductor manufacturing.

1. Precursor Material for Silicon Nitride Films
   Organopolysilazanes are important precursors for depositing silicon nitride films. Silicon nitride films play a crucial role in semiconductor devices. For example, in transistors and capacitors, they can provide excellent insulation performance and mechanical stability. The preparation process of this film is achieved through the pyrolysis or chemical vapor deposition of organopolysilazanes, which enables precise control of the film's thickness and uniformity.
2. Insulation and Encapsulation Materials
   In semiconductor manufacturing, organopolysilazanes are widely used as insulation materials and encapsulation materials for integrated circuits due to their low dielectric constant and high thermal conductivity. Their good insulation performance can effectively prevent current leakage, and at the same time, their high thermal conductivity helps with rapid heat dissipation, ensuring the stable operation of semiconductor devices in high-temperature environments.
3. High-temperature-resistant Coatings
   The semiconductor manufacturing process involves high-temperature processes. Organopolysilazanes can be converted into high-temperature-resistant ceramic materials (such as SiCNO, SiCN, or SiO₂), and the hardness of the cured coating can reach above 8H. This coating is not only resistant to high temperatures but also has excellent oxidation resistance and corrosion resistance, which can protect semiconductor devices from the erosion of high temperatures and chemical environments.

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