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Organopolysilazane is widely used in semiconductor devices and is particularly prominent in the following applications:

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Organopolysilazane is widely used in semiconductor devices and is particularly prominent in the following applications:


1. **Chip Packaging**


Organopolysilazane is extensively used as a high-performance packaging material in chip packaging. It offers excellent insulation properties and thermal management capabilities, effectively protecting chips from external environmental influences while ensuring stable operation under high-temperature conditions. The low dielectric constant and high thermal conductivity of this material make it an ideal insulating and heat-dissipating material.


2. **Silicon Nitride Film Deposition**


In semiconductor manufacturing, silicon nitride films are a crucial component of many electronic devices, such as transistors and capacitors. Organopolysilazane serves as a precursor material for silicon nitride films. Through pyrolysis or chemical vapor deposition (CVD) processes, the thickness and uniformity of the films can be precisely controlled. These films not only provide excellent insulation properties but also enhance the mechanical stability and durability of the devices.


3. **High-Temperature Coatings**


The stability of organopolysilazane under high-temperature conditions makes it an ideal coating material. It can be converted into high-temperature-resistant ceramic materials (such as SiCNO, SiCN, or SiO₂), which are used to manufacture high-temperature components in semiconductor devices, such as crucibles, molds, and other high-temperature structural materials. These coatings are not only heat-resistant but also possess anti-oxidation and corrosion-resistant properties.

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